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Principle of vacuum magnetron sputtering coating

​In the process of electron flying to the substrate accelerate under the action of electric field, it collides with argon atoms and ionizes a large numbers of argon ions and electrons, and then the electrons fly to substrate. Under the action of electric field, argon ion accelerates to bombard the target

agnetron reactive sputtering insulator

​Magnetron reactive sputtering insulator looks easy, but the actual operation is difficult

How to improve the efficiency of sputtering target material

​Although increasing the pressure can improve the ionization rate, but at a higher pressure, the chance of collision between the sputtering target particles and gas also increases

What is the principle of sputtering target

​Sputtering target is a new physical vapor coating method, which has obvious advantages in many aspects compared with earlier evaporation coating method. As a mature technology, magnetron sputtering has been applied in many fields. The company makes "new concept, new technology, sputtering target new products" and "the pursuit of customer satisfact

Operation process of magnetron sputtering coating target material

​The operation process of magnetron sputtering target is not clear to many people, and the work content of magnetron sputtering target is not understood

Characteristics of magnetron sputtering target material

​Magnetron sputtering coating is a new physical vapor coating method, compared with earlier evaporation coating method, its many advantages are quite obvious. As a mature technology, magnetron sputtering has been applied in many fields

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