UNIPOL-1203 chemical mechanical grinding and polishing machine, suitable for CMP flatness and smoothing process technology, the grinding part of the machine adopts anti-corrosion materials, chemical corrosion resistance, automatic dripper and precision grinding and polishing controller, automatic touch screen panel, from the processing performance and speed to meet the needs of wafer and other surface processing.
UNIPOL-1203 chemical mechanical grinding and polishing machine, suitable for CMP flatness and smoothing process technology, the grinding part of the machine adopts anti-corrosion materials, chemical corrosion resistance, automatic dripper and precision grinding and polishing controller, automatic touch screen panel, from the processing performance and speed to meet the needs of wafer and other surface processing.
Ø Super flat stainless steel polishing disc (flatness is less than 0.0025mm per 25mm×25mm).
Ø Super precision rotating shaft (tray end jump less than 0.01mm).
Ø There are two processing stations, which can be controlled separately.
Ø Equipped with fully automatic control touch screen panel, you can set the spindle speed, swing arm speed, grinding time.
Ø Configuration of automatic drip, flow rate visual adjustment, automatic grinding and polishing.
Ø Equipped with GPC-100A precision grinding and polishing controller, the pressure can be adjusted, the surface shape can be trimmed, so that the grinding and polishing is more convenient and fast.
Ø The grinding part is made of anti-corrosion material, resistant to chemical corrosion.
If you are interested in our Chemical mechanical grinding and polishing machine, please contact us for more information and a quote.
Contact number: +8615617875939
E-mail: gordon@zztainuo.com
Contact: Gordon Zhang
Wechat: 15617875939
WhatsApp: +8613592553141
Product name | UNIPOL-1203 chemical mechanical grinding and polishing machine |
Product model | UNIPOL-1203 |
Installation condition | 1. Temperature and humidity: 10-85%RH (at 25℃ no condensation) Temperature: 5-45℃. 2. There is no strong source and corrosive gas around the equipment. 3. Power supply: single-phase: AC220V 50Hz national standard three-pole socket 10A (the socket must have good safety protection grounding wire) 4. Cooling water: The equipment is equipped with an upper water outlet and a lower water outlet, and it is necessary to connect the tap water and drainage pipeline or circulation filtration system by itself. 5. Workbench: It is recommended to use an operating platform or desktop that can bear more than 200kg 6. Ventilation device: good ventilation environment, no special ventilation device requirements 7. Other auxiliary equipment (need to be purchased separately) : Recommended: 1) HEATER-3040 or 250 heating platform 2) SKCH-1 precision thickness gauge 3) SKCS-1 type blow dryer 4) YJXZ-12 stirring circulation pump |
Main parameter
| Grinding machine part parameters 1. Power supply port: AC220V 50Hz 2. Total power: 500W(MAX) 3. Grinding disc diameter: Φ300 mm cast iron flower plate, stainless steel plate each 1 4. Sample plate diameter: Φ105 ceramic plate sample plate, ceramic repair plate ring each 1 5. Number of working stations: 2 6. Main drive motor: precision servo motor 0.45KW 7. Swing arm drive motor: DC gear motor DC24V 0.8W 8. Lower grinding disc speed: 1-240rpm (adjustable speed) 9. Swing arm speed gear: 1-15 gear adjustable 10. Control mode: touch screen 11. Equipment dimensions: L550×W700×H420mm 12. Net weight: ≈82Kg |
GPC-100A Precision Grinding and Polishing Controller (Manipulator) 1. Sample plate diameter: Ø103mm 2. Axial travel of loading tray: 12mm 3. Precision of digital display table: 0.001mm 4. The loading pressure of the loading tray is adjustable: 0.1kg-2.0kg 5. Effective range of pressure confirmation instrument: 1-5000g 6. Sample loading method: vacuum adsorption 7. Bearing sample size: diameter ≤103mm, thickness ≤12mm 8. Dimensions: Outer diameter Φ146mm, height 266mm | |
SKZD-2 Dispenser (Drum mixing) 1. Power supply port: DC24 2.5A (Standard power adapter IN:AC100-240V OUT: DC24V 2.5A) 2. Volume: 1.5L 3. Drip mode: cylinder rotation physical drip 4. Flow rate: 0-35ml/min (stepless speed regulation) 5. Drive motor: DC gear motor: DC24V 10W 6. Overall dimension: L290×W170×H350mm | |
SKZD-4 Automatic Dispenser (Suspension) 1. Power supply port: DC122A (Standard power adapter IN:AC100-240V OUT: DC12V 2A) 2. Drip station (drip pump) : 4 (1-4 position transfer) 3. Liquid bottle volume: 500ml/ bottle 4. Drive control mode: precision stepper motor + peristaltic pump + single board controller 5. Drip method: peristaltic quantitative drip 6. Flow rate: 0.1ml/min-10ml/min (adjustable speed) 7. Operation mode: timed operation: range: 1-999min 8. Dimensions: L230×W370×H450mm | |
AP-1400V oil-free vacuum pump 1. Power supply port: AC220V 50Hz 450W 2. Air flow max: 7.2m³/h 3. Vacuum max: -700mmHg (-91KPa) 4. Noise: ≤60db 5. Thermal protector: automatic reset 130 ° C ±5 ° C 6. Overall dimension: L204×W125×H181mm | |
Note: 1. The power supply of the device is the national standard single-phase AC 220V 50Hz. The actual power supply parameters are subject to the label affixed to the rear of the product. 2. Can be customized according to user requirements all kinds of grinding disc, special loading sample plate, fixture, special parts and so on. |
Serial number | Name | Quantity |
1 | Cast iron grinding disc (with 300mm flower plate) | 1set |
2 | Stainless steel grinding disc (300mm flat plate) | 1set |
3 | Loading tray (ceramic) | 1set |
4 | Repair ring (ceramic) | 1set |
5 | Polishing pad (frosted leather, synthetic leather, polyurethane) | 1 piece of each type |
6 | Magnetic sheet (with adhesive backing) Polished negative | 2pieces |
7 | Polished negative | 2pieces |
8 | Corundum grinding powder | 0.5kg |
9 | Paraffin stick | 4 |
10 | Silica suspension polishing liquid 2040 W0.05 | 1 bottle |
Chemical mechanical grinding and polishing machine (CMP) has a wide range of applications, mainly including the following aspects:
1.Semiconductor industry: CMP technology is widely used in semiconductor manufacturing for the planarization of interlayer media (ILD), insulators, conductors, embedded metals (such as W, Al, Cu, Au), polysilicon, silicon oxide channels, etc.
2.Thin film storage disk: CMP technology is also applied in the manufacturing process of thin film storage disks to achieve high surface leveling.
3.Microelectromechanical Systems (MEMS): In the field of microelectromechanical systems, CMP technology is used to achieve surface smoothness at the micron and even nanometer levels.
4.Ceramics, magnetic heads, mechanical abrades, precision valves: In these fields, CMP technology is used to improve the surface quality and finish of products.
5.Optical glass and metal materials: CMP technology is also applied in the field of surface processing of optical glass and metal materials to achieve the required surface smoothness and finish.
6.Materials Science Research: In the field of materials science research, CMP technology is used to prepare metallographic samples for microstructure analysis and performance testing.
7.Industrial production: In the automotive, aerospace, electronics and other industries, CMP technology is used for quality control and to improve the quality and finish of product surfaces.
8.Medical industry: In the medical industry, CMP technology is used to prepare high-precision medical equipment parts, such as artificial joints, cardiac pacemakers, etc.
9.Jewelry processing: In the field of jewelry processing, CMP technology is used for polishing and polishing of gold and silver jewelry, gems, etc., to improve the added value of products.
10.Architectural decoration: In the architectural decoration industry, CMP technology is used for the surface treatment of marble, granite and other stones to obtain good decorative effects.
To sum up, chemical-mechanical grinding machines play an important role in a number of industries, especially in the field of semiconductor manufacturing and materials science research, where their applications are particularly widespread.
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